Define the optical interface
A finished mask is defined by the clear and opaque regions, orientation, critical dimensions and the exposure method in which it will be used.
Chrome-on-Fused-Silica Photomasks
Patterned chromium masks on synthetic fused silica for UV pattern transfer and applications requiring low substrate thermal expansion.
Stable glass for demanding exposure
This is a finished patterned photomask. Fused silica can offer low thermal expansion and useful UV transmission, but the material grade, operating wavelength and thickness determine the appropriate substrate.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Finished patterned mask
- Pattern route
- Finished patterned mask
- Line-width tolerance
- ±0.2 µm
- Order basis
- Approved drawing and inspection plan
Transfer a controlled optical pattern
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Use it when the exposure wavelength or dimensional stability makes material choice significant, including repeated thermal cycles and layouts with long coordinate spans.
| Property | Specification |
|---|---|
| PropertyProduct configuration | SpecificationFinished chrome pattern on synthetic fused silica |
| PropertySubstrate role | SpecificationUV transmission and low-expansion behavior to the process |
| PropertyWriting reference | SpecificationMinimum feature and CD values depend on the selected writing configuration |
| PropertyOptical coating target | SpecificationChrome density and reflectance at the operating wavelength |
| PropertyAcceptance focus | SpecificationMaterial identity, geometry, pattern registration and defects |
Applications and selection
Use it when the exposure wavelength or dimensional stability makes material choice significant, including repeated thermal cycles and layouts with long coordinate spans.
- Contact and proximity lithography
- Semiconductor, display and circuit patterning
- Optical instrumentation and custom microfabrication
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Artwork and polarity
Fused silica grade and mask format
Exposure and optical conditions
Wavelength, optical density and reflectance
Registration and acceptance
Minimum feature, placement and polarity
Where this product is used
Finished masks on a low-expansion substrate.
Patterned chromium masks on fused silica for a compatible exposure process.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
Is a fused-silica photomask blank already patterned?
No. A blank is the unpatterned starting material. This product includes the transferred chromium pattern defined by your artwork.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Verify material identification, substrate geometry, critical pattern dimensions and clear/opaque defect criteria.
What to provide in the drawing or inquiry
- Fused silica grade and mask format
- Wavelength, optical density and reflectance
- Minimum feature, placement and polarity
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Chrome-on-fused-silica photomasks use transparent and opaque features on fused silica for exposure and precision pattern transfer.
Choose the operating spectrum, substrate thickness, polarity and surface condition together with the exposure configuration.
Information for your inquiry
Artwork, silica grade, wavelength, outline, thickness, film side and alignment datums.
Why specify the substrate when the artwork is unchanged?
The substrate determines transparent material, optical thickness, thermal behaviour and handling. Identical artwork can still require different material and mounting specifications.