Define the optical interface
A finished mask is defined by the clear and opaque regions, orientation, critical dimensions and the exposure method in which it will be used.
Chrome-on-Glass Photomasks
Patterned chromium on glass for optical pattern transfer. Specify clear and opaque regions, minimum feature size, pattern orientation and the exposure wavelength.
Pattern transfer starts with the mask
A finished chrome-on-glass photomask uses transparent windows and opaque chromium to form an exposure image. It transfers geometry through a photoresist process; the mask is the reusable pattern source, not the processed workpiece.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Finished patterned mask
- Pattern route
- Finished patterned mask
- Line-width tolerance
- ±0.2 µm
- Order basis
- Approved drawing and inspection plan
Transfer a controlled optical pattern
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Choose a physical mask when the same layout will be exposed repeatedly, or when the exposure tool uses masks to align successive layers. It can support prototypes as well as repeated production.
| Property | Specification |
|---|---|
| PropertyProduct configuration | SpecificationFinished binary chrome-on-glass photomask |
| PropertyPattern definition | SpecificationClear and opaque regions to approved artwork |
| PropertyWriting reference | SpecificationConfiguration I / II / III selected around feature size and field |
| PropertyExposure route | SpecificationContact, proximity or other specified exposure method |
| PropertyAcceptance focus | SpecificationCritical dimensions, placement, polarity and clear/opaque defects |
Applications and selection
Choose a physical mask when the same layout will be exposed repeatedly, or when the exposure tool uses masks to align successive layers. It can support prototypes as well as repeated production.
- Contact and proximity lithography
- Semiconductor, display and circuit patterning
- Optical instrumentation and custom microfabrication
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Artwork and polarity
Artwork polarity
Exposure and optical conditions
Minimum line and space
Registration and acceptance
Optical density at the exposure wavelength
Where this product is used
Opaque/clear artwork for a compatible exposure process.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
What does positive or negative mean on a photomask?
Terminology can depend on the exposure workflow. Provide a marked drawing showing exactly which regions must be clear and which must remain chrome.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Check critical dimensions, placement, clear defects, opaque defects and pattern orientation against the approved artwork.
What to provide in the drawing or inquiry
- Artwork polarity
- Minimum line and space
- Optical density at the exposure wavelength
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Chrome-on-glass photomasks carry artwork as transparent and opaque regions for optical exposure and pattern transfer.
Confirm polarity, line width, spacing, viewing direction, exposure area and wavelength. Keep pattern and mechanical drawings on the same revision.
Information for your inquiry
Artwork, exposure method, wavelength, substrate thickness, film-side orientation, active area and quantity.
How do artwork direction and exposure direction relate?
Specify the viewing side and which way the patterned surface faces, including right-reading or mirrored artwork. The same pattern appears reversed when viewed from opposite sides.