Define the optical interface
A finished mask is defined by the clear and opaque regions, orientation, critical dimensions and the exposure method in which it will be used.
Proximity Photomasks
Chrome photomasks for exposure across a controlled gap between the mask and the photoresist-coated workpiece.
Pattern transfer across a defined gap
A proximity photomask exposes a resist-coated surface across a small, controlled gap. It provides the light-blocking pattern while avoiding deliberate physical contact with the resist.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Finished patterned mask
- Pattern route
- Finished patterned mask
- Line-width tolerance
- ±0.2 µm
- Order basis
- Approved drawing and inspection plan
Transfer a controlled optical pattern
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Consider proximity exposure for surfaces that should avoid mask contact, provided the required features can be transferred at the chosen gap and wavelength.
| Property | Specification |
|---|---|
| PropertyProduct configuration | SpecificationChrome photomask for exposure across a specified gap |
| PropertyProcess input | SpecificationWavelength, nominal gap and target printed feature |
| PropertyPattern bias | SpecificationMask-side bias agreed around gap diffraction and process result |
| PropertyWriting reference | SpecificationLine/space and CD uniformity selected for the mask drawing |
| PropertyAcceptance focus | SpecificationMask geometry and defects, separated from printed-workpiece results |
Applications and selection
Consider proximity exposure for surfaces that should avoid mask contact, provided the required features can be transferred at the chosen gap and wavelength.
- Contact and proximity lithography
- Semiconductor, display and circuit patterning
- Optical instrumentation and custom microfabrication
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Artwork and polarity
Exposure wavelength and nominal proximity gap
Exposure and optical conditions
Mask critical dimensions and artwork bias
Registration and acceptance
Mask flatness and usable exposure field
Where this product is used
Masks for a specified exposure gap.
Pattern transfer with the exposure gap defined by the process.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
How does this differ from a contact mask?
The operating gap changes pattern transfer and surface-contact requirements. The same substrate format can be used, but the process and artwork requirements must be reviewed for that gap.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Inspect mask features, registration, flatness and chrome defects. Define mask acceptance separately from the customer exposure-process result.
What to provide in the drawing or inquiry
- Exposure wavelength and nominal proximity gap
- Mask critical dimensions and artwork bias
- Mask flatness and usable exposure field
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Proximity photomasks transfer optical patterns across a specified mask-to-workpiece gap.
Define gap, exposure geometry, usable area and smallest line-and-space features together. The fixture must maintain the required relative position.
Information for your inquiry
Working gap, exposure wavelength, artwork, plate thickness, active area and mounting datums.
Is the artwork file sufficient for an order?
Also state exposure mode, working gap, viewing direction and substrate outline so the manufacturing data matches the optical arrangement.