Define the optical interface
A finished mask is defined by the clear and opaque regions, orientation, critical dimensions and the exposure method in which it will be used.
Contact Photomasks
Photomasks for exposure with the patterned surface in contact with the resist-coated workpiece. Surface cleanliness, flatness and pattern orientation are central to the specification.
A mask made for contact exposure
A contact photomask forms the exposure image with its patterned face against the resist-coated workpiece. Close spacing helps preserve fine detail; particles and surface relief can interrupt contact and affect the printed image.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Finished patterned mask
- Pattern route
- Finished patterned mask
- Line-width tolerance
- ±0.2 µm
- Order basis
- Approved drawing and inspection plan
Transfer a controlled optical pattern
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Suitable when the workpiece is sufficiently flat and the process permits contact with the resist surface. The exposure tool and resist process determine the practical transfer limit.
| Property | Specification |
|---|---|
| PropertyProduct configuration | SpecificationChrome photomask prepared for contact exposure |
| PropertyContact surface | SpecificationPattern side, cleanliness and flatness defined for the fixture |
| PropertyWriting reference | SpecificationCritical line/space and placement follow the approved artwork |
| PropertyEdge control | SpecificationUsable field and edge exclusion specified separately |
| PropertyAcceptance focus | SpecificationContact-surface condition, particles, pinholes and pattern orientation |
Applications and selection
Suitable when the workpiece is sufficiently flat and the process permits contact with the resist surface. The exposure tool and resist process determine the practical transfer limit.
- Contact and proximity lithography
- Semiconductor, display and circuit patterning
- Optical instrumentation and custom microfabrication
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Artwork and polarity
Pattern-side orientation
Exposure and optical conditions
Contact surface and cleanliness
Registration and acceptance
Usable exposure area
Where this product is used
Masks for exposure with the patterned surface at the workpiece.
Patterned contact-exposure tooling.
Pattern transfer in contact-exposure workflows.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
Can the same artwork be viewed from either side?
Looking through the glass reverses the view relative to the chrome side. Mark the viewing side and readable text direction on the drawing.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Inspect critical features, defects and contact-surface condition; define cleanliness and permissible edge exclusions.
What to provide in the drawing or inquiry
- Pattern-side orientation
- Contact surface and cleanliness
- Usable exposure area
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Contact photomasks transfer a pattern with the patterned face in contact with the resist-coated workpiece.
Define contact area, film-side orientation, cleanliness, flatness and workpiece condition alongside the exposure process.
Information for your inquiry
Polarity, contact face, wavelength, workpiece dimensions, exposure area and clamping arrangement.
How do contact and proximity masks differ?
Contact exposure places the mask against the coated workpiece. Proximity exposure keeps a specified gap. Select the mode and its exposure conditions for the equipment and workpiece.