Define the optical interface
A finished mask is defined by the clear and opaque regions, orientation, critical dimensions and the exposure method in which it will be used.
Large-Area Photomasks
Glass photomasks with an extended patterned area for larger exposure fields. Overall format, usable pattern area and registration requirements must be specified separately.
A larger field controlled by the drawing
A large-area photomask carries an extended active field on one substrate. It can contain a single large structure or an array of repeated units whose positions share a common coordinate reference.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Finished patterned mask
- Pattern route
- Finished patterned mask
- Line-width tolerance
- ±0.2 µm
- Order basis
- Approved drawing and inspection plan
Transfer a controlled optical pattern
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Choose it when a panel, repeated array or long layout should be exposed in a common field compatible with the tool, rather than assembled from separately positioned exposures.
| Property | Specification |
|---|---|
| PropertyProduct configuration | SpecificationLarge-format chrome photomask with a defined active field |
| PropertyReference field | SpecificationUp to 205 × 205 mm or 410 × 410 mm, subject to configuration |
| PropertySubstrate format | SpecificationUp to 9 × 9 in or 17 × 17 in, subject to fixture |
| PropertyStitching reference | SpecificationStitching stability and full-field registration defined on the drawing |
| PropertyAcceptance focus | SpecificationActive-field placement, flatness, stitching and edge exclusion |
Applications and selection
Choose it when a panel, repeated array or long layout should be exposed in a common field compatible with the tool, rather than assembled from separately positioned exposures.
- Contact and proximity lithography
- Semiconductor, display and circuit patterning
- Optical instrumentation and custom microfabrication
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Artwork and polarity
Overall and active dimensions
Exposure and optical conditions
Registration datums
Registration and acceptance
Flatness over the usable area
Where this product is used
Finished masks covering an extended exposure field.
Masks for larger panels and repeated layouts.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
Are the substrate outline and patterned area identical?
Usually not. Holding, alignment and edge exclusion can reduce the usable field. Specify both dimensions.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Measure full-field registration, representative critical features, flatness and defects over the agreed active area.
What to provide in the drawing or inquiry
- Overall and active dimensions
- Registration datums
- Flatness over the usable area
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Large-area photomasks carry exposure patterns over an extended substrate for large-field pattern transfer.
Distinguish the substrate outline, active pattern area and location datums. Define alignment and inspection locations across the field.
Information for your inquiry
Overall dimensions, active area, tiled or array relationships, alignment marks, substrate and inspection regions.
Is the whole glass plate an active pattern area?
Not necessarily. Edges may be reserved for handling, cleaning or alignment. Dimension the substrate and usable exposure field separately.