Define the optical interface
The substrate sets the optical path, dimensional base and surface condition for the process that follows.
Fused Silica Substrates
Fused silica substrates for UV photolithography, microfabrication and precision optical patterning.
Low-expansion glass for demanding optics
The material is selected when dimensional stability, ultraviolet transmission or thermal behavior matters to the pattern and the exposure process. The specification should identify fused silica clearly; “quartz” is a broader term and should not replace the material designation in a technical drawing.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Optical glass substrate
- Pattern route
- Drawing-defined configuration
- Primary definition
- Material, geometry and surface follow the drawing
- Order basis
- Approved drawing and inspection plan
A stable starting point for patterned glass
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Choose fused silica for an optical path or patterning process where UV transmission and dimensional stability matter more than selecting the lowest-cost general glass.
| Property | Specification |
|---|---|
| PropertyMaterial | SpecificationSynthetic fused silica |
| PropertySquare formats | Specification3 / 4 / 6 / 7 / 8 / 9 in |
| PropertyThickness | Specification≥0.3 mm |
| PropertyTotal thickness variation (TTV) | Specification≤2 µm |
| PropertyFlatness | Specification≤2 µm |
Applications and selection
Choose fused silica for an optical path or patterning process where UV transmission and dimensional stability matter more than selecting the lowest-cost general glass.
- Photomask and reticle fabrication
- Calibration targets and imaging references
- Encoder discs and patterned optical components
- UV photolithography
- Microfabrication and MEMS mask preparation
- Precision optical patterning
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Material and geometry
Fused silica grade and spectral range
Surface and optical behaviour
Dimensions, thickness, flatness and parallelism
Documentation and packaging
Surface quality, edge finish and cleanliness
Where this product is used
Uncoated substrates where UV transmission and thermal stability matter.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
Is fused silica the same as quartz?
They are related terms but should not be treated as interchangeable in a technical specification. Identify the exact material required for the application.
Why choose fused silica?
Fused silica is commonly selected for its dimensional stability, low thermal expansion and useful UV transmission.
Can fused silica be chrome coated?
Yes, when the following patterning process requires a chrome-coated blank.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Inspect the finished component against the approved drawing and agreed acceptance plan.
What to provide in the drawing or inquiry
- Fused silica grade and spectral range
- Dimensions, thickness, flatness and parallelism
- Surface quality, edge finish and cleanliness
- Packaging and inspection documentation
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Fused silica substrates provide a low-expansion transparent base for optical coatings, photolithographic patterns and ultraviolet optical components.
Specify the actual silica grade, working spectrum, thickness and surface requirements. Separate the optical clear aperture from the edge used for mounting.
Information for your inquiry
Silica grade, wavelength range, outline, thickness, clear aperture, surface quality and edges.
Is a bare fused silica substrate a finished photomask?
A bare substrate supplies the material and finished surfaces. A functional photomask also needs the specified opaque pattern; chrome-coated and resist-coated supply states support the intervening process steps.