Define the optical interface
The coating stack must suit the exposure wavelength, patterning route and inspection method that follow.
Chrome-coated glass blanks prepared for photolithographic patterning and custom photomask fabrication.
Also described as chrome-on-glass blanks, they are supplied before the final pattern transfer step. The blank is defined by the substrate, chromium film, optical density or reflectivity target, surface condition and the photoresist process that will follow.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.

Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
The coating stack must suit the exposure wavelength, patterning route and inspection method that follow.
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Choose the supply stage that matches the processes you perform in-house: bare glass before coating, chromium-coated glass before resist coating, or a resist-coated plate before exposure.
| Property | Specification |
|---|---|
| PropertyProduct type | SpecificationUnpatterned chrome-coated photomask blank |
| PropertySubstrate | SpecificationGlass or fused silica, as specified |
| PropertyChrome layer | SpecificationSputtered or deposited chromium; thickness to specification |
| PropertyOptical behavior | SpecificationOptical density, reflectivity or contrast target to process |
| PropertySurface | SpecificationFlatness, surface quality, cleanliness and edge condition |
Choose the supply stage that matches the processes you perform in-house: bare glass before coating, chromium-coated glass before resist coating, or a resist-coated plate before exposure.
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Substrate material, size and thickness
Chrome thickness, optical density and reflectivity
Photoresist compatibility and coating condition
Chrome-coated starting material when resist coating follows separately.
Short answers to the questions that affect material choice, pattern definition and acceptance.
It is an unpatterned glass or fused silica substrate with a chromium film, supplied for a later patterning process.
It can be supplied with or without photoresist, depending on the required process route.
Yes. The coating and resist route should be specified around the laser direct-write process.
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspect the finished component against the approved drawing and agreed acceptance plan.
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productChrome-coated photomask blanks are polished substrates with an unpatterned chromium film for subsequent pattern fabrication.
Match the substrate and plate format to the chromium stack, optical density, defect grade and any required photoresist coating.
Substrate, plate dimensions, chromium and optical requirements, downstream resist process, defect grade and quantity.
No. A blank provides a uniform film. Compatible resist coating, exposure, development and etching create the pattern. Supply artwork when ordering a finished patterned component.