Define the optical interface
The coating stack must suit the exposure wavelength, patterning route and inspection method that follow.
Photoresist-Coated Chrome Plates
Photoresist-coated photomask blanks made by DC magnetron sputtering and spin coating, for display, semiconductor, optical and circuit-patterning applications.
Ready for the next exposure step
Our multilayer coating option uses DC magnetron sputtering to deposit chromium oxynitride / chromium nitride / chromium oxynitride, followed by photoresist spin coating. Subsequent exposure, development, chromium-film etching and resist removal produce the finished mask pattern.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Chrome-coated glass blank
- Pattern route
- Drawing-defined configuration
- Primary definition
- Material, geometry and surface follow the drawing
- Order basis
- Approved drawing and inspection plan
Prepare the surface for reliable pattern transfer
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Choose the supply stage that matches the processes you perform in-house: bare glass before coating, chromium-coated glass before resist coating, or a resist-coated plate before exposure.
| Property | Specification |
|---|---|
| PropertySubstrate | SpecificationDouble-side-polished soda-lime or white crown glass |
| PropertySquare formats | Specification3 / 4 / 5 / 6 / 7 in |
| PropertyChrome film families | SpecificationLRC / HRC / BCB |
| PropertyPhotoresist options | SpecificationAZ 1500 / IP 3500 / AZ TFP650; additional positive-resist grades listed below |
| PropertyResist thickness | Specification0.4–20 µm depending on resist model; fixed-thickness grades also available |
Applications and selection
Choose the supply stage that matches the processes you perform in-house: bare glass before coating, chromium-coated glass before resist coating, or a resist-coated plate before exposure.
- Laser direct-write photomasks
- Contact and proximity exposure
- Microfabrication and optical pattern transfer
- Flat-panel display photomasks
- Semiconductor and MEMS photomasks
- Optical-component pattern transfer
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Substrate and geometry
Photoresist chemistry and polarity
Chrome or resist stack
Target resist thickness and coating area
Optical and inspection requirements
Exposure wavelength and development route
Where this product is used
Photosensitive starting blanks for laser-written mask fabrication.
Resist-coated blanks for the display-mask fabrication step.
Starting material for making the glass phototool.
Resist-coated starting blanks for teams making their own masks.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
Is a resist-coated blank already a finished photomask?
No. The blank carries the photosensitive coating but has not yet been patterned. Exposure and subsequent pattern-transfer steps turn it into a photomask. The listed industries describe the uses of those finished masks and patterned components.
Which photoresists are available?
Fixed-thickness grades include AZ 1500, IP 3500 and AZ TFP650. Additional options include AZ 4562, AZ 4620, AZ TFP650F5, GRX M237 and THMR IP3500. Select the exact model, thickness and uniformity specification from the tables below.
What information is needed for quotation?
Include substrate, dimensions, resist type or polarity, target thickness, exposure method and quantity.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Inspect the finished component against the approved drawing and agreed acceptance plan.
What to provide in the drawing or inquiry
- Photoresist chemistry and polarity
- Target resist thickness and coating area
- Exposure wavelength and development route
- Soft-bake, cleanliness and handling requirements
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Photoresist-coated chrome plates combine a glass substrate, chromium-based film and pre-applied resist for a compatible exposure process.
Choose resist model, tone, thickness, sensitivity range and developer chemistry together with the exposure equipment. Plate size alone does not define process compatibility.
Information for your inquiry
Substrate format, resist model and thickness, exposure method, coated area, edge-bead exclusion and quantity.
How does a coated plate differ from a finished mask?
The coated plate is a prepared process material. A finished mask already contains the drawing-defined transparent and opaque regions. Choose according to whether you will fabricate or use the pattern.