Define the optical interface
The coating stack must suit the exposure wavelength, patterning route and inspection method that follow.
Chrome-on-Fused-Silica Photomask Blanks
Chrome-on-fused-silica blanks for UV lithography, microfabrication and high-stability photomask applications.
Chrome on a stable fused-silica base
This configuration is selected when substrate stability and the optical behavior of the fused silica matter together with the chrome patterning process. Film, surface and dimensional requirements should be confirmed against the exposure system and the final pattern.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Chrome-coated glass blank
- Pattern route
- Drawing-defined configuration
- Primary definition
- Material, geometry and surface follow the drawing
- Order basis
- Approved drawing and inspection plan
Prepare the surface for reliable pattern transfer
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Choose the supply stage that matches the processes you perform in-house: bare glass before coating, chromium-coated glass before resist coating, or a resist-coated plate before exposure.
| Property | Specification |
|---|---|
| PropertyProduct type | SpecificationUnpatterned chrome-on-fused-silica blank |
| PropertySubstrate | SpecificationFused silica, grade and spectral range to specification |
| PropertyChrome layer | SpecificationDeposited chromium; thickness and optical target to specification |
| PropertyGeometry | SpecificationSize, thickness, flatness, parallelism and edge condition |
| PropertyNext process | SpecificationPhotoresist coating, laser writing or mask exposure |
Applications and selection
Choose the supply stage that matches the processes you perform in-house: bare glass before coating, chromium-coated glass before resist coating, or a resist-coated plate before exposure.
- Laser direct-write photomasks
- Contact and proximity exposure
- Microfabrication and optical pattern transfer
- UV photolithography
- MEMS and microfabrication mask preparation
- High-stability optical pattern transfer
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Substrate and geometry
Fused silica material and optical range
Chrome or resist stack
Chrome thickness, density and reflectivity
Optical and inspection requirements
Dimensions, flatness and surface quality
Where this product is used
Unpatterned fused-silica blanks for subsequent resist coating and mask making.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
When should I choose a chrome-on-fused-silica blank?
Use it when fused silica stability or UV behavior is important to the patterning and exposure process.
Can it be supplied photoresist coated?
Yes, when the resist type, thickness and exposure route are defined.
Are the dimensions standard?
Dimensions and tolerances are confirmed from the project drawing or mask format.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Inspect the finished component against the approved drawing and agreed acceptance plan.
What to provide in the drawing or inquiry
- Fused silica material and optical range
- Chrome thickness, density and reflectivity
- Dimensions, flatness and surface quality
- Resist compatibility, cleaning and packaging
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Chrome-on-fused-silica blanks combine a fused silica substrate with a chromium film for later photolithographic patterning.
Choose film opacity, surface and defect requirements together with the working spectrum and substrate dimensional stability.
Information for your inquiry
Silica grade, outline, thickness, chromium stack, exposure wavelength, resist state and inspection requirements.
Is this a finished fused silica photomask?
It is an unpatterned coated material. A finished mask has already been processed to the approved artwork; specify the supply state that matches your manufacturing step.