Define the optical interface
A finished mask is defined by the clear and opaque regions, orientation, critical dimensions and the exposure method in which it will be used.
Multi-Layer Photomask Sets
Coordinated sets of glass photomasks with shared alignment marks, layer identification and artwork revision control for sequential exposures.
Aligned masks for multi-layer exposure
A multilayer mask set provides a separate optical pattern for each lithography step. Shared alignment features connect openings, conductors and other successive structures to a common coordinate system.
Choose the product around the substrate, coating, pattern and exposure conditions that the finished component must support.
- Product type
- Finished patterned mask
- Pattern route
- Finished patterned mask
- Line-width tolerance
- ±0.2 µm
- Order basis
- Approved drawing and inspection plan
Transfer a controlled optical pattern
Start with the job the component must perform, then confirm the material and geometry that make the result repeatable.
Separate component and system values
Material, coating and pattern tolerances describe the component. Exposure performance and system accuracy also depend on the instrument, process and mounting.
Keep the next process predictable
The supplied geometry, surface condition and inspection records are reviewed around the actual process instead of a generic product name.
Technical specifications
Use a set when later exposures must register to earlier structures, such as electrode, opening and alignment layers in a microfabrication process.
| Property | Specification |
|---|---|
| PropertyProduct configuration | SpecificationCoordinated mask set with shared alignment datums |
| PropertyLayer control | SpecificationLayer identity, polarity and artwork revision per mask |
| PropertyAlignment reference | Specification225 nm or 350 nm 2nd-layer alignment reference by configuration |
| PropertyData package | SpecificationShared origin, global/local marks and coordinate transforms |
| PropertyAcceptance focus | SpecificationInter-mask registration and revision traceability |
Applications and selection
Use a set when later exposures must register to earlier structures, such as electrode, opening and alignment layers in a microfabrication process.
- Contact and proximity lithography
- Semiconductor, display and circuit patterning
- Optical instrumentation and custom microfabrication
Customize around the process
Material, dimensions, surface, pattern, coating and documentation can be reviewed together when the standard configuration is not enough.
Artwork and polarity
Layer list, revision and polarity per layer
Exposure and optical conditions
Shared origin and alignment-mark geometry
Registration and acceptance
Inter-mask registration tolerance
Where this product is used
Coordinated layers with shared alignment datums.
Related mask layers with consistent alignment features.
Coordinated mask layers for shared alignment and artwork revision control.
Common questions
Short answers to the questions that affect material choice, pattern definition and acceptance.
Does mask registration equal final device overlay?
No. Final overlay also depends on exposure alignment, substrate deformation and process conditions. State both requirements separately.
Acceptance and drawing inputs
Confirm these items after the product type and core parameters are selected. They define how the finished component is manufactured, checked and documented.
Inspection and acceptance
Inspect layer identity, feature dimensions and registration against shared datums; retain the approved artwork revision for each mask.
What to provide in the drawing or inquiry
- Layer list, revision and polarity per layer
- Shared origin and alignment-mark geometry
- Inter-mask registration tolerance
Send the drawing, reference artwork or preliminary specification for manufacturing and inspection review.
Discuss this productSelection notes
Multi-layer photomask sets place the patterns for successive processing steps on a coordinated set of masks.
Define layer identifiers, revisions, shared coordinates and alignment marks. Manage inter-layer registration separately from local line width.
Information for your inquiry
Layer artwork, process order, origin, alignment marks, polarity, revisions and layer-specific requirements.
Can each layer be treated as an unrelated drawing?
The layers combine on the same workpiece and need shared datums and compatible revisions. Checking each pattern independently does not establish registration between layers.